Avtor/Urednik | Kerč, J; Vrečer, F; Srčič, S; Šmid-Korbar, J | |
Naslov | Thermal decomposition of pure piroxicam and its surface deposit on amorphous silicon dioxide: mechanism and kinetic data | |
Tip | članek | |
Vir | Thermochim Acta | |
Vol. in št. | Letnik 154 | |
Leto izdaje | 1989 | |
Obseg | str. 305-14 | |
Jezik | eng | |
Abstrakt | The thermal behaviour of piroxicam (white anhydrous form) and its surface deposit (50 wt.%) on amorphous silicon dioxide was studied using TG and DSC techniques. On the basis of isothermal TG, thermal decomposition kinetic data were obtained and renetion mechanisms were established according to Sharp's method. It was tound that the thermal decomposition of pure piroxicam was heterogeneous, but that the surface deposit decomposed homogeneously throughout the whole reaction. | |
Deskriptorji | PIROXICAM SILICON DIOXIDE TECHNOLOGY, PHARMACEUTICAL THERMOGRAVIMETRY |